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光化学机械研磨方法及光敏活性研磨液
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First Author : HSQ

Disigner of the Invention : HSQ,HSQ

Affilication of Author(s) : 301

Type of Patent : 发明

Application Number : 202310037046.X

Issue Date : 2023-1-10

Service Invention or Not : no

Number of Inventors : 1

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Associate Professor
Supervisor of Master's Candidates

Degree : 博士学位

Alma Mater : 浙江工业大学

Education Level : 博士研究生毕业

School/Department : 机械工程学院

Date of Employment : 2021-12-16

Discipline : Mechanical Manufacture and Mutomation

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